PlasTEP: Dissemination and fostering of plasma based technological innovation for environment protection in the Baltic Sea region.
Pollution control is a transnational problem for all countries and a strategic aim of the European Union. This is reflected in the increasing tightening of the exhaust emission standards particularly in the Baltic Sea region BSR countries.
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- Thin Films Deposition and Characterization Laboratory.
The objective of the project is to direct plasma based cleaning technologies for atmospheric air and water treatment towards practical application. There are 15 partners from the countries bordering the Baltic Sea. It ran from to The inspiration of this project is the natural mechanism of bacterial attack of healthy cells.
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The outer cell walls are ruptured by an array of protein toxins, lipases and other enzymes secreted by these bacteria. These are immobilised on currently available wound dressing materials such as polypropylene or polyethylene non-wovens using a range of deposition processes. This will minimize the need for frequent traumatic changes of wound dressing and will provide a simple optical indicator of bacterial infection.
The main objective of this research is to gain new information and to develop an innovative method to simultaneously remove pollutants and recover valuable compounds ecoefficiently from wastewaters. The developed technologies would be designed based on the green chemistry and engineering principles, therefore, implementing the principles for sustainable development. ASTRaL's task is to develop surface modification techniques using atomic layer deposition to enhance the performance of filtration systems for the removal of heavy metals and other pollutants from contaminated water.
This project developed a spatial atomic layer deposition for application to moving flexible material.
The application was barrier layers on paper-based materials. Responsible and contacts: Ana Maria Amaral , ext: The laboratory is equipped with a range of systems for thin film deposition, materials processing and characterization.
Chemical Physics of Thin Film Deposition Processes for Micro- And Nano-Technologies
The current areas of research include: amorphous silicon materials and devices, transparent and conductive oxides and their applications and crystalline silicon solar cells and electronic devices. Characterization systems: — Electrical characterization systems:. Access conditions: Within collaborative research work. Contact the scientific researcher in charge.
Projects - Thin film coatings - ugyjukavikog.tk
Low temperature equipment: An optical OXFORD bath cryostat is used for transport and for photoluminescence measurements in the temperature range between 80 K and K. Microwave reflectometer: Contact-less measurement of carrier mobility and recombination lifetime is accessible with a microwave resonator system operated at 2. Successfully reported this slideshow. We use your LinkedIn profile and activity data to personalize ads and to show you more relevant ads.
Chemical Physics of Thin Film Deposition Processes for Micro- And Nano-Technologies (Paperback)
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